SiCN coatings prepared by PACVD from TMS-NH3-Ar system on steel
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منابع مشابه
SiCN Amorphous Materials Chemical Vapour Deposited Using the Si(CH3)4-NH3-H2 System
Elaboration of amorphous SiCPc: materials was performed using a conventional thermaly activated CVD at 100012003C from the '1MS-NH3-H2 system. 'I'he influence on the deposition rate and the composition was investigated using an experimental design by varq-ing: deposition temperature, pressure and hTb flow rate. A set of 16 samples SiCxNy with x!y ranged from 0.0.1. to 1.69 was prepared. .4ccura...
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ژورنال
عنوان ژورنال: Le Journal de Physique IV
سال: 1993
ISSN: 1155-4339
DOI: 10.1051/jp4:1993333